发明名称 SUBSTRATE PEELING/CLEANING METHOD AND MANUFACTURING METHOD OF SUBSTRATE FOR ELECTRO-OPTICAL APPARATUS
摘要 PROBLEM TO BE SOLVED: To ensure a sheet-fed cleaning, reduce the cost, and ensure cleaning harmless environmentally by employing as a peeling solution an aqueous oxalic acid solution at a low temperature with low concentration. SOLUTION: The cleaning method is characterised by being provided with a process (step S23) for processing a substrate with the aqueous oxalic acid solution with a concentration of 1 to 10 % at a temperature of 30 to 50°C. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004235422(A) 申请公布日期 2004.08.19
申请号 JP20030022010 申请日期 2003.01.30
申请人 SEIKO EPSON CORP 发明人 MIURA EIICHI
分类号 G02F1/13;G02F1/1333;H01L21/308;(IPC1-7):H01L21/308;G02F1/133 主分类号 G02F1/13
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