发明名称 A process for preparation of an electrical contact region on an n-conductive AlGaInP-based layer by the steps useful in semiconductor technology
摘要 <p>A process for preparation of an electrical contact region on an n-conductive AlGaInP-based layer by:application of an electrical contact material containng Au and at least one doping material, i.e. an element from the group Ge, Si, Sn, and Te, and of tempering the n-conductive AlGaInP-based layer. An independent claim is included for a structural element having an epitaxial semiconductor layer series with an electromagnetic radiation emitting active zone.</p>
申请公布号 DE10308322(A1) 申请公布日期 2004.08.19
申请号 DE2003108322 申请日期 2003.02.26
申请人 OSRAM OPTO SEMICONDUCTORS GMBH 发明人 PLOESL, ANDREAS;ILLEK, STEFAN;STAUSS, PETER;WEGLEITER, WALTER;WIRTH, RALPH;STEIN, WILHELM;PIETZONKA, INES;DIEPOLD, GUDRUN
分类号 H01L33/30;H01L33/40;(IPC1-7):H01L33/00;H01L21/283 主分类号 H01L33/30
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