OPTIMIZATION METHOD OF ILLUMINATION CONDITION OF LITHOGRAPHY PROJECTION SYSTEM USING FULL COMPUTER SIMULATION AND PROCESS WINDOW MATRIX, LITHOGRAPHY PROJECTION SYSTEM AND MACHINE INTERPRETATION-POSSIBLE MEDIUM ENCODED WITH INSTRUCTION WORD CAPABLE OF BEING RUN IN THE MACHINE

摘要

PURPOSE: Provided are a method for optimizing the illumination condition of a lithography projection system by using a full computer simulation and a process window matrix, a lithography projection system and a machine interpretation-possible medium encoded with an instruction word capable of being run in a machine for the optimization. CONSTITUTION: The method comprises the steps of restricting the lithography pattern to be printed on a substrate; selecting a simulation model; selecting the grid of source points in the pupil plane of the illuminator of a lithography projection system; calculating additional response value corresponding to the individual source point, wherein the each response value represents the result of single or a series of simulation using the simulation model; and adjusting the illumination arrange of the illuminator based on the analysis of the accumulated result of the additional calculated values. Preferably the response value is a focus exposure matrix and resulted in a process window comprising the information of dose latitude and depth of focus.