发明名称 CONTACT FORMING MASK AND CONTACT FORMING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a contact forming mask and a contact process for forming a good contact without changing a manufacturing process . <P>SOLUTION: The contact mask 202 has a contact pattern 208. The contact pattern 208 has an exposure region. In order to obtain a halftone effect at the edge of the contact pattern 208, the edge of the contact pattern 208 is so designed as to include a series of saw teeth. The saw teeth creating the contour of the edge are saw teeth 206a of a sharp point. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004233967(A) 申请公布日期 2004.08.19
申请号 JP20030352108 申请日期 2003.10.10
申请人 AU OPTRONICS CORP 发明人 CHANG CHIH-CHIN;YEN SHIH-YI
分类号 G03B27/32;G03F1/00;G03F1/68;H01L21/027;H01L21/768;(IPC1-7):G03F1/08 主分类号 G03B27/32
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