发明名称 |
CONTACT FORMING MASK AND CONTACT FORMING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a contact forming mask and a contact process for forming a good contact without changing a manufacturing process . <P>SOLUTION: The contact mask 202 has a contact pattern 208. The contact pattern 208 has an exposure region. In order to obtain a halftone effect at the edge of the contact pattern 208, the edge of the contact pattern 208 is so designed as to include a series of saw teeth. The saw teeth creating the contour of the edge are saw teeth 206a of a sharp point. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
申请公布号 |
JP2004233967(A) |
申请公布日期 |
2004.08.19 |
申请号 |
JP20030352108 |
申请日期 |
2003.10.10 |
申请人 |
AU OPTRONICS CORP |
发明人 |
CHANG CHIH-CHIN;YEN SHIH-YI |
分类号 |
G03B27/32;G03F1/00;G03F1/68;H01L21/027;H01L21/768;(IPC1-7):G03F1/08 |
主分类号 |
G03B27/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|