发明名称 |
Semiconductor device having vertical transistor |
摘要 |
A semiconductor device is provided which can avoid electrical short circuits between contact plugs, connected to gate electrodes, and source/drain regions. Portions of a polysilicon film (7) that are covered by photoresist (8) are left nonetched to form plate-like polysilicon films (10). The polysilicon films (10) are formed on a first portion of an element isolation insulating film (2). The polysilicon films (10) are connected to polysilicon films (9). Contact plugs (24) are formed on the polysilicon films (10). This prevents electrical short circuits between the contact plugs (24) and drain and source regions (5) and (6).
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申请公布号 |
US2004159857(A1) |
申请公布日期 |
2004.08.19 |
申请号 |
US20030689059 |
申请日期 |
2003.10.21 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
HORITA KATSUYUKI;KUROI TAKASHI;KITAZAWA MASASHI |
分类号 |
H01L21/8234;H01L21/8242;H01L27/088;H01L27/108;H01L29/78;(IPC1-7):H01L27/10 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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