发明名称 |
Process for fabrication of a liquid crystal display with thin film transistor array free from short-circuit |
摘要 |
Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.
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申请公布号 |
US2004160542(A1) |
申请公布日期 |
2004.08.19 |
申请号 |
US20040782908 |
申请日期 |
2004.02.23 |
申请人 |
NEC LCD TECHNOLOGIES, LTD. |
发明人 |
TAGUCHI NAOYUKI |
分类号 |
H01L29/786;G02F1/136;G02F1/1362;G02F1/1368;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L27/13;(IPC1-7):G02F1/134 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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