| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material for fabricating an LCD which forms a resist pattern with high resolution even under a low NA condition and has good linearity. <P>SOLUTION: A resist pattern is formed by using a positive photoresist composition characterized in that it contains (A)an alkali-soluble resin, (B)an esterification reaction product having an average esterification ratio of 30 to 90% comprising a low-molecular-weight novolac resin having a polystyrene-reduced mass average molecular weight of 300 to 1,300 and a naphthoquinone-diazide-sulfonic-acid compound, (C)a phenolic-hydroxyl-group-containing compound having a molecular weight of not more than 1,000, and (D)an organic solvent. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
