A method and system for identifying a defect or contamination on a surface of a material. The method and system involves providing a material, such as a semiconductor wafer, using a non-vibrating contact potential difference sensor to scan the wafer, generate contact potential difference data and processing that data to identify a pattern characteristic of the defect or contamination.
申请公布号
WO2004070355(A2)
申请公布日期
2004.08.19
申请号
WO2004US03003
申请日期
2004.02.03
申请人
QCEPT TECHNOLOGIES INC.;STEELE, M., BRANDON;HAWTHORNE, JEFFREY, ALAN;KIM, CHUNHO;SOWELL, DAVID, C.
发明人
STEELE, M., BRANDON;HAWTHORNE, JEFFREY, ALAN;KIM, CHUNHO;SOWELL, DAVID, C.