发明名称 HOLDER FOR VAPOR DEPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a holder for vapor deposition, which enhances a precision of a position to be vapor-deposited on a member to be vapor-deposited. SOLUTION: This holder for vapor deposition comprises a vapor deposition mask 12 having a plurality of openings 15 for forming a predetermined vapor-deposited pattern on a translucent substrate 10 with an evaporated vapor-depositing material 4, and a masking part 16 for preventing formation of the above vapor deposition pattern on the translucent substrate 10; a mask holder 13 for supporting the vapor deposition mask 12; and a reinforcing member 14 which is sandwiched and held between the vapor deposition mask 12 and the mask holder 13, and has a plurality of opening windows 24 corresponding to the openings 15, and a flexure-preventing part 23 for preventing deflection of the masking part 16. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004232050(A) 申请公布日期 2004.08.19
申请号 JP20030023485 申请日期 2003.01.31
申请人 NIPPON SEIKI CO LTD 发明人 ONO TOMOHIRO;WATANABE SHUNSUKE
分类号 H05B33/10;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):C23C14/24 主分类号 H05B33/10
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