发明名称 |
Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same |
摘要 |
Compositions that can be used in semiconductor manufacturing processes, comprising perhydro-polysilazane having a weight average molecular weight of about 300 to about 3,000 and a polydispersity index of about 1.8 to about 3.0 are provided. Solutions comprising the compositions of the present invention, methods of forming films in a semiconductor manufacturing process, and methods of manufacturing semiconductor devices are also provided.
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申请公布号 |
US2004161944(A1) |
申请公布日期 |
2004.08.19 |
申请号 |
US20040776823 |
申请日期 |
2004.02.11 |
申请人 |
HONG EUNKEE;NA KYUTAE;GOO JUSEON;KIM HONG GUN |
发明人 |
HONG EUNKEE;NA KYUTAE;GOO JUSEON;KIM HONG GUN |
分类号 |
H01L21/20;H01L21/312;H01L21/316;H01L21/768;(IPC1-7):H01L21/31 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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