| 摘要 |
PROBLEM TO BE SOLVED: To prevent contamination of a substrate due to a substrate processing liquid, mist and the like, and to make continuously performable a series of chemical processings including spin drying of the substrate with the same device. SOLUTION: The processor is provided with a substrate holder 16 holding and rotating the substrate, a spatter prevention cup 18 surrounding a periphery of the substrate W held by the substrate holder 16 and preventing spatter of substrate processing liquid supplied to the substrate W, and a scattering prevention cup cleaning part 44 cleaning the inner wall face of the scattering prevention cup 18. The scattering prevention cup 18 can freely move upward/downward among a lower substrate transfer position, an upper scattering prevention position and a cleaning position between them. COPYRIGHT: (C)2004,JPO&NCIPI
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