EQUIPMENT FOR MEASURING RESISTIVITY OF POLYSILICON SUBSTRATE AND METHOD FOR MEASURING RESISTIVITY USING IT

摘要

PROBLEM TO BE SOLVED: To provide equipment for measuring the resistivity of a polysilicon substrate in which the problem of prior art that many measuring points are required on the polysilicon substrate because of significant variation in the measurements of resistivity is solved, and to provide a method for measuring the resistivity using that equipment.

SOLUTION: In the method for measuring the resistivity of the polysilicon substrate using four probes arranged at a constant interval on a line, the pitch between the probes is set in the range of 4-20 mm.

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