| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of mask blanks for easily manufacturing a large quantity of mask blanks by performing a local etching, and to provide the mask blanks, an etching device and a manufacturing method of a semiconductor device. <P>SOLUTION: A thin film 8 of at least one layer is formed on one surface of a substrate 9. A part equivalent to at least one thin film region is removed from the other surface of the substrate 9. The substrate 9 is worked into a support body of the thin film 8. Plasma is locally generated in a part equivalent to the thin film region by an electrode corresponding to a size and a shape of the thin region, a region equivalent to the thin film region of the substrate 9 is removed, and the substrate 9 is worked. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
