| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent fine resist patterns from falling in a drying process after development processing in forming the resist patterns. <P>SOLUTION: The positive type resist composition is used in a resist pattern forming method including a process of substituting the liquid existing on a substrate after alkaline development with a liquid for critical drying, then drying the liquid for critical drying through a critical state. The composition contains a resin component (A) which is ≤20mol% in the content of alkaline solubility, has an acid dissociative dissolution suppressing group and is increased in the alkaline solubility by the effect of an acid, an acid forming agent component (B) which generates an acid by exposure and an organic solvent (C) which dissolves the components (A) and (B). The component (A) has (a1) a constitutional unit including the acid dissociative dissolution suppressing group, (a2) a constitutional unit including a lactone unit, and (a3) a constitutional unit including an alcoholic hydroxyl group-containing polycyclic group. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
