CMP PAD WITH COMPOSITE TRANSPARENT WINDOW

摘要

The invention is directed to chemical-mechanical polishing pads comprising a transparent window comprising a polymer resin having a first index of refraction and an inorganic material having a second index of refraction. The transparent window has a light transmittance of 10% or more at a wavelength of 200nm to 10,000 nm. The difference between the first index of refraction and the second index of refraction is 0.3 o less at the wavelength.