METHOD FOR MEASURING THICKNESS OF THIN FILM

摘要

PURPOSE: A method for measuring thickness of a thin film is provided to set up a reference value and measure the thickness by using an X-ray reflectometry and an X-ray fluorescence spectroscopy. CONSTITUTION: X-rays are irradiated on a surface of a reference wafer including a reference thin film(S100). The thickness of the reference thin film is measured by using the X-rays reflected from the reference wafer(S200). A reference value is set up by using the measured thickness of the reference thin film(S300). The X-rays are irradiated on the surface of a target wafer including a thin film as a measuring target(S400). The intensity of fluorescent X-rays generated from the target wafer is measured(S500). The thickness of the target thin film is measured by comparing the measured intensity with the reference value(S600).