发明名称 |
TRANSPARENT IMPACT RESISTANT IMPROVED POLYSTYRENE BASED ON STYRENE/BUTADIENE BLOCK COPOLYMER, ITS POLYMER MIXTURE AND PROCESSES FOR THEIR PRODUCTION |
摘要 |
PROBLEM TO BE SOLVED: To provide a transparent impact resistant improved polystyrene with favorable balance in the ratios of toughness and stiffness without conventional drawbacks. SOLUTION: The block copolymer is produced from an aromatic vinyl monomer and contains at least two hard blocks S<SB>1</SB>and S<SB>2</SB>. The block copolymer contains at least one random soft block B/S produced from the aromatic vinyl monomer and a diene between the hard blocks S<SB>1</SB>and S<SB>2</SB>, and contains less than 20% of 1,2-vinyl in the soft block B/S and has the hard block ratios at 51-74 mass% in the total block copolymers without containing a single polymer block B composed of the diene. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004231975(A) |
申请公布日期 |
2004.08.19 |
申请号 |
JP20040147673 |
申请日期 |
2004.05.18 |
申请人 |
BASF AG |
发明人 |
KNOLL KONRAD;FISCHER WOLFGANG;GAUSEPOHL HERMANN;KOCH JUERGEN;WUENSCH JOSEF;NAEGELE PAUL |
分类号 |
C08J5/00;C08F293/00;C08F297/04;C08L25/06;C08L53/02;(IPC1-7):C08F297/04 |
主分类号 |
C08J5/00 |
代理机构 |
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地址 |
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