发明名称 |
Methods for etch loading plannar lightwave circuits |
摘要 |
This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
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申请公布号 |
US2004159855(A1) |
申请公布日期 |
2004.08.19 |
申请号 |
US20040773802 |
申请日期 |
2004.02.06 |
申请人 |
WON JONGIK;HO CALVIN KA KUEN;ZHONG FAN;ZHAO LIANG |
发明人 |
WON JONGIK;HO CALVIN KA KUEN;ZHONG FAN;ZHAO LIANG |
分类号 |
G02B6/12;G02B6/136;G02B6/28;G02B6/34;(IPC1-7):H01L31/033 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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