发明名称 Methods for etch loading plannar lightwave circuits
摘要 This relates to optical devices such as planar light-wave components/circuits which are designed to have a high waveguide pattern density effecting a higher etch selectivity and overall improved dimensional control of the functional waveguides on the optical device.
申请公布号 US2004159855(A1) 申请公布日期 2004.08.19
申请号 US20040773802 申请日期 2004.02.06
申请人 WON JONGIK;HO CALVIN KA KUEN;ZHONG FAN;ZHAO LIANG 发明人 WON JONGIK;HO CALVIN KA KUEN;ZHONG FAN;ZHAO LIANG
分类号 G02B6/12;G02B6/136;G02B6/28;G02B6/34;(IPC1-7):H01L31/033 主分类号 G02B6/12
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