METHOD FOR MANUFACTURING SEMI-TRANSPARENT SEMI-REFLECTIVE ELECTRODE SUBSTRATE, REFLECTIVE ELEMENT SUBSTRATE, METHOD FOR MANUFACTURING SAME, ETCHING COMPOSITION USED FOR THE METHOD FOR MANUFACTURING THE REFLECTIVE ELECTRODE SUBSTRATE

摘要

An etchant for selective etching is used to simplify the production process of a semi-transparent semi-reflective electrode substrate, and temporal loss is not produced by avoiding troublesome repeated works, thereby efficiently providing a semi-transparent semi-reflective electrode substrate. A method for manufacturing a semi-transparent semi-reflective electrode substrate where a metal oxide layer (12) made of at least indium oxide and an inorganic compound layer (14) at least made of Al or Ag are formed in order of mention. The method comprises a step of etching the inorganic compound layer (14) with an etchant lambda composed of phosphoric acid, nitric acid, and acetic acid and a step of etching the metal oxide layer (12) with an etchant sigma containing oxalic acid.