SUBSTRATE CLEANING APPARATUS USING ULTRAVIOLET RAYS

摘要

PURPOSE: A substrate cleaning apparatus using ultraviolet rays is provided to enhance the cleaning performance by measuring and controlling easily an interval between a substrate and a quartz window. CONSTITUTION: A quartz window(118) is opposite to one side of a substrate(1). An ultraviolet source(112) is installed at an upper part of the quartz window in order to radiate ultraviolet rays to one side of the substrate. A moving plate(120) is used for supporting the substrate. A moving assembly(130) is used for controlling an interval between the substrate and the moving plate by moving the moving plate. A contact gauge(200a) is moved along the moving plate in order to be stuck to or be separated from a plurality of touch pads(204a).