发明名称 Lithographic apparatus with a balanced positioning system
摘要 A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction forces are kept within the balanced positioning system. The balance mass may be a rectangular balance frame (2) having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame. <IMAGE>
申请公布号 EP1111469(A3) 申请公布日期 2004.08.18
申请号 EP20000311361 申请日期 2000.12.19
申请人 ASML NETHERLANDS B.V. 发明人 KWAN, YIM BUN PATRICK;VAN DE WIEL, WILHELMUS THEODORUS PETRUS
分类号 G03F7/20 主分类号 G03F7/20
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