Photosensitive polyimide precursor and its use for pattern formation,申请号EP19970109762-传众专利搜索

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发明名称	Photosensitive polyimide precursor and its use for pattern formation
摘要
申请公布号	EP0814109(B1)	申请公布日期	2004.08.18
申请号	EP19970109762	申请日期	1997.06.16
申请人	HITACHI CHEMICAL COMPANY, LTD.	发明人	KIKKAWA, HARUHIKO;KATAOKA, FUMIO;TAKEMOTO, ISSEI;TANAKA, JUN;ISODA, KEIKO;UCHIMURA, SHUNICHIRO;KAJI, MAKOTO;SUGIURA, MINORU
分类号	G03F7/027;C08G73/10;C08L79/08;G03F7/031;G03F7/038;G03F7/40;H01L21/027;H01L21/312;(IPC1-7):C08G73/10;G03F7/004;C08G73/12;G03F7/037	主分类号	G03F7/027
代理机构		代理人
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