发明名称 FIELD EFFECT TRANSISTOR HAVING SOURCE AND/OR DRAIN FORMING SCHOTTKY OR SCHOTTKY-LIKE CONTACT WITH STRAINED SEMICONDUCTOR SUBSTRATE
摘要 The present invention is a field effect transistor having a strained semiconductor substrate and Schottky-barrier source and drain electrodes, and a method for making the transistor. The bulk charge carrier transport characteristic of the Schottky barrier field effect transistor minimizes carrier surface scattering, which enables the strained substrate to provide improved power and speed performance characteristics in this device, as compared to conventional devices.
申请公布号 KR20040072738(A) 申请公布日期 2004.08.18
申请号 KR20047011357 申请日期 2003.01.15
申请人 发明人
分类号 H01L21/28;H01L21/335;H01L21/336;H01L21/8234;H01L29/10;H01L29/417;H01L29/47;H01L29/51;H01L29/78;H01L29/786;H01L29/872 主分类号 H01L21/28
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