发明名称 |
SPUTTERING TARGET MATERIAL |
摘要 |
Provided is a sputtering target material which has a high reflectance and which is excellent in a sulfurization resistance, comprising an Ag alloy prepared by alloying Ag with a specific small amount of the metal component (A) selected from In, Sn and Zn, a specific small amount of the metal component (B) selected from Au, Pd and Pt and, if necessary, a small amount of Cu. |
申请公布号 |
EP1371749(A4) |
申请公布日期 |
2004.08.18 |
申请号 |
EP20020705228 |
申请日期 |
2002.03.15 |
申请人 |
ISHIFUKU METAL INDUSTRY CO., LTD.;NIPPON SHEET GLASS CO., LTD. |
发明人 |
HASEGAWA, KOICHI;ISHII, NOBUO;ASAKI, TOMOYOSHI |
分类号 |
C22C5/06;C22C5/08;C23C14/14;C23C14/34;G11B7/258;G11B7/26 |
主分类号 |
C22C5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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