| 摘要 |
PURPOSE: A wafer cleaning apparatus is provided to improve uniformity by effectively preventing oxidation of an outmost wafer in drying the wafer. CONSTITUTION: A wafer cleaning apparatus includes a cleaning container(10) for removing particles of a wafer(40), a moving arm(50), and a wafer passivation layer(60). The moving arm transports the wafer to the cleaning container and a drying container(20). The wafer passivation layer is formed at one side of the moving arm to protect an outmost wafer. The wafer passivation layer having same shape to the wafer is made of quartz.
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