发明名称 |
Chamber components having textured surfaces and method of manufacture |
摘要 |
A domed enclosure wall for a plasma processing chamber is made from a dielectric material having a roughened surface with a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating is applied on the roughened surface of the dielectric material. The plasma sprayed coating comprises a textured surface having a roughness with an average skewness that is a negative value. When the enclosure wall is used in a plasma processing chamber, sputtered material generated by a plasma formed in a plasma processing chamber has good adherence to the textured surface.
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申请公布号 |
US6777045(B2) |
申请公布日期 |
2004.08.17 |
申请号 |
US20010895862 |
申请日期 |
2001.06.27 |
申请人 |
APPLIED MATERIALS INC. |
发明人 |
LIN SHYH-NUNG;MENZIE MARK D.;SOMMERS JOE F.;CLAWSON DANIEL OWEN;MORI GLEN T.;SHARP LOLITA L. |
分类号 |
H05H1/46;B01J19/08;C04B41/87;C23C16/44;C23F4/00;H01J37/32;H01L21/3065;H05H1/32;H05H1/42;(IPC1-7):B32B1/08;B32B17/06;H01L21/306;C23C16/00;C23C14/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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