发明名称 Manufacturing apparatus and manufacturing method for semiconductor device
摘要 A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.
申请公布号 US6777355(B2) 申请公布日期 2004.08.17
申请号 US20030718392 申请日期 2003.11.20
申请人 SONY CORPORATION 发明人 KISAKIBARU TOSHIRO;HONBORI ISAO;KATO YASUSHI;SUZUKI TOSHIKAZU;KORIYAMA HIROHISA;IWAMOTO HAYATO;ABE HITOSHI
分类号 F24F7/06;H01L21/00;H01L21/205;(IPC1-7):H01L21/31;H01L21/469;B01L1/04 主分类号 F24F7/06
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