发明名称 |
Method for preparing light-absorbing polymeric compositions |
摘要 |
The present invention recites a method comprising reacting in a solvent in the presence of a basea) at least one diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1200 nm and 99-0 mole % of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm, withb) an organic compound of Formula IIwherein B is a divalent organic radical to form a light absorbing composition comprising a mixture of a polymer having the formulaand a cyclic compound having the general formulawherein B is as defined above; n is at least 2, m is 1, 2, 3 or 4 and A comprises the residue of a diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1000 nm and wherein the remaining portion of A comprises the residue of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm.
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申请公布号 |
US6776930(B2) |
申请公布日期 |
2004.08.17 |
申请号 |
US20000751766 |
申请日期 |
2000.12.29 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
WEAVER MAX ALLEN;KRUTAK, SR. JAMES JOHN;MAXWELL BRIAN EDISON;RHODES GERRY FOUST;HILBERT SAMUEL DAVID;FLEISCHER JEAN CARROLL;PARHAM WILLIAM WHITFIELD |
分类号 |
C08L101/00;C09B1/32;C09B1/58;C09B1/62;C09B5/14;C09B29/01;C09B29/033;C09B29/08;C09B29/36;C09B31/02;C09B35/14;C09B57/00;C09B69/10;C09K3/00;(IPC1-7):F21V9/00;F21V9/04;C08F283/00;C08G63/00 |
主分类号 |
C08L101/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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