发明名称 Electrostatic chucking system, and apparatus and method of manufacturing a semiconductor device using the electrostatic chucking system
摘要 A voltage is applied to an electrode of an electrostatic chuck for chucking a semiconductor substrate, and the application voltage is controlled stepwise by means of a voltage control section. In the electrostatic chucking system, a temperature sensor may be provided for detecting the temperature of the semiconductor substrate held by the electrostatic chuck, wherein a signal output from the temperature sensor is input to the voltage control section to thereby control the applied voltage.
申请公布号 US6778377(B2) 申请公布日期 2004.08.17
申请号 US20000732891 申请日期 2000.12.11
申请人 RENESAS TECHNOLOGY CORP. 发明人 HAGI KIMIO
分类号 B23Q3/15;B23Q3/154;H01L21/00;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/683;H02N13/00;(IPC1-7):H01T23/00 主分类号 B23Q3/15
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