发明名称
摘要 PURPOSE: An apparatus for fixing a chamber for semiconductor manufacturing process using a magnetic field is provided to fix the cover and the body of the reaction chamber by applying a predetermined voltage to a gap between the cover and the body. CONSTITUTION: A shielding plate(90) is installed in one side of the chamber and between the body(60) and the cover(70) of the reaction chamber. A power supplying unit(80) applies a predetermined voltage to the body and cover of the reaction chamber, generating a magnetic field between the body and the cover by using the applied voltage and installed in the other side of the chamber.
申请公布号 KR100444719(B1) 申请公布日期 2004.08.16
申请号 KR20010033938 申请日期 2001.06.15
申请人 发明人
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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