发明名称 |
Plasma processing unit and high-frequency electric power supplying unit |
摘要 |
A plasma processing unit of the present invention includes a processing container whose inner pressure can be reduced, a first electrode arranged in the processing container, a process gas supplying unit that supplies a process gas into the processing container, a high-frequency electric power source that outputs high-frequency electric power having a frequency in a VHF band, a matching unit electrically connected to the high-frequency electric power source and the first electrode for impedance matching, and a transmission line that transmits the high-frequency electric power from the high-frequency electric power source to the matching unit. A substrate to be processed is adapted to be arranged in the processing container. The high-frequency electric power transmitted to the first electrode is adapted to generate plasma in such a manner that the substrate to be processed can undergo a plasma process by means of the plasma. The transmission line has a length shorter than a length wherein a resonance state of a third harmonic wave of the high-frequency electric power may be generated.
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申请公布号 |
US2004154540(A1) |
申请公布日期 |
2004.08.12 |
申请号 |
US20040775145 |
申请日期 |
2004.02.11 |
申请人 |
HAYAMI TOSHIHIRO;IWASAKI MASAHIDE;TAKAHIRA JUNICHI;WATANABE KAZUYOSHI;KOMATSU SHINICHI;SASAKI YUICHI |
发明人 |
HAYAMI TOSHIHIRO;IWASAKI MASAHIDE;TAKAHIRA JUNICHI;WATANABE KAZUYOSHI;KOMATSU SHINICHI;SASAKI YUICHI |
分类号 |
H05H1/46;C23C16/505;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):C23C16/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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