| 发明名称 |
PATTERNING LAYERS COMPRISED OF SPIN-ON CERAMIC FILMS |
| 摘要 |
The present invention comprises a method for forming a hardmask including the steps of depositing a polymeric preceramic precursor film atop a substrate; converting the polymeric preceramic precursor film into at least one ceramic layer, where the ceramic layer has a composition of SivNWCXOyHZ where 0.1<= v<= 0.9, 0<=w< 0.5, 0.05<= x<= 0.9, 0<= y<= 0.5, 0.05<= z<= 0.8 for v+w+x+y+z=l; forming a patterned photoresist atop the ceramic layer; patterning the ceramic layer to expose regions of the underlying substrate, where a remaining region of the underlying substrate is protected by the patterned ceramic layer; and etching the exposed region of the underlying substrate. Another aspect of the present invention is a buried etch stop layer having a composition of SivNWCXOyHZ where 0.05<v<0.8, 0<w<0.9, 0.05<x<0.8, 0<y<0.8, 0.05<z<0.8 for v+w+x+y+z=1. |
| 申请公布号 |
WO2004068551(A2) |
申请公布日期 |
2004.08.12 |
| 申请号 |
WO2004US02126 |
申请日期 |
2004.01.26 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION;GATES, STEPHEN, M.;HEDRICK, JEFFREY, C.;HUANG, ELBERT, E.;PFEIFFER, DIRK |
发明人 |
GATES, STEPHEN, M.;HEDRICK, JEFFREY, C.;HUANG, ELBERT, E.;PFEIFFER, DIRK |
| 分类号 |
G03G13/06;H01L;H01L21/00;H01L21/311;H01L21/312;H01L21/316;H01L21/44;H01L23/48;H05B6/64 |
主分类号 |
G03G13/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
