发明名称 INFRARED ABSORPTION MEASURING METHOD, INFRARED ABSORPTION MEASURING DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an infrared absorption measuring method and an infrared absorption measuring device at low cost and high accuracy. <P>SOLUTION: This infrared absorption measuring method includes (a) measurement of infrared absorption of a measuring object component in the state where a sample gas containing the measuring object component is depressurized, (b) calculation of a light absorption area of a peak region for showing the measuring object component in the infrared absorption, and (c) calculation of the concentration of the measuring object component in the sample gas from the light absorption area and the pressure of the sample gas at the depressurization time. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004226103(A) 申请公布日期 2004.08.12
申请号 JP20030011115 申请日期 2003.01.20
申请人 SEIKO EPSON CORP 发明人 MINAMIMOMOSE ISAMU
分类号 G01N21/27;G01N21/35;G01N21/3504;H01L21/205;(IPC1-7):G01N21/35 主分类号 G01N21/27
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