发明名称 SUBSTRATE TREATMENT APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To treat a substrate in such a way that the waste solution of a treatment liquid may not reattach to a front surface of a treated substrate, nor may stay there long by efficiently collecting the waste solution of the treatment liquid left over after the treatment of the substrate surface. SOLUTION: The treatment liquids 3a and 3b jet out from a pair of treatment liquid supply nozzles 2a and 2b which are installed in face to face with each other are supplied onto the front surface 4a of the substrate 4. Then, the treatment liquids 3a and 3b bump against each other to be blown up in directions shown by arrows 5a and 5b to generate droplets and mist. The waste solution of the blown-up treatment liquids 3a and 3b is collected in a waste solution reservoir 8 and then is discharged from a waste solution exhaust port 9. Meanwhile, the droplets and the mist drift upwards inside a waste solution collecting means 6. Part of the droplets and the mist is trapped by slant surfaces 7a and 7b of a top plate 7, grows to larger droplets, and eventually falls down into the waste solution reservoir 8 to be stored there. A part of the droplets and the mist is never trapped by the slant surfaces 7a and 7b of the top plate 7 and is discharged from a mist exhaust port 10. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004228301(A) 申请公布日期 2004.08.12
申请号 JP20030013594 申请日期 2003.01.22
申请人 SHARP CORP 发明人 YAMAMOTO HIROYUKI
分类号 G03F7/30;H01L21/027;H01L21/304;H01L21/306;(IPC1-7):H01L21/304 主分类号 G03F7/30
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