| 摘要 |
PROBLEM TO BE SOLVED: To control amount of an etchant used in the etching method which is suitably used for removing a fragile layer of the member including the fragile layer such as a porous layer or ion implanted layer. SOLUTION: A liquid etchant 3 is supplied to an etchant vessel 4, the etchant is vaporized with a vaporization unit 6, and the fragile layer 1a such as the porous layer is selectively etched with the vaporized etchant. COPYRIGHT: (C)2004,JPO&NCIPI
|
