发明名称 FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD, AND METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method in which film deposition irregularities are prevented from being caused by heat puckering, and film deposition of excellent yield can be realized when depositing a hard film (DLC film) mainly consisting of carbon, and a method for manufacturing a magnetic recording medium. SOLUTION: The film deposition apparatus comprises a plurality of guide rolls 6 to allow a long base body to run, a film deposition unit 3 of a hard film consisting mainly of carbon, and a cooling can 4 which is installed close to the film deposition unit 3 to cool a base body 10 during the film deposition, and an ion gun 7 is disposed on the upstream side of the cooling can 4. In the film deposition method, the base body is delivered from the rolls, subjected to the treatment on the surface opposite to the film deposition surface by the ion gun, and introduced into the cooling can when depositing the hard film mainly consisting of carbon on the continuously running long base body. In the magnetic recording medium manufacturing method, the hard film consisting mainly of carbon is deposited on a magnetic layer by the film deposition method after forming at least the magnetic layer on a non-magnetic base body. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004225143(A) 申请公布日期 2004.08.12
申请号 JP20030017150 申请日期 2003.01.27
申请人 TDK CORP 发明人 KOBAYASHI KEITA;TANABE YOSHIHIKO
分类号 C23C16/27;G11B5/84;(IPC1-7):C23C16/27 主分类号 C23C16/27
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