发明名称 CONTROLLED SULFUR SPECIES DEPOSITION PROCESS
摘要 <p>The present invention is a method for the deposition of a thin film of a pre-determined composition onto a substrate, the thin film comprising ternary, quaternary or higher sulfide compounds selected from the group consisting of thioaluminates, thiogallates and thioindates of at least one element from Groups IIA and IIB of the Periodic Table. The method comprises volatizing at least one source material of a sulfide of a pre-determined composition to form a sulfur-bearing thin film composition on a substrate and simultaneously inhibiting any excess quantity of sulfur-bearing species volatilized from the at least one source material from impinging on the substrate. The method improves the luminance and emission spectrum of phosphor materials used for full colour ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.</p>
申请公布号 WO2004067676(A1) 申请公布日期 2004.08.12
申请号 WO2004CA00097 申请日期 2004.01.26
申请人 IFIRE TECHNOLOGY INC.;XIN, YONGBAO;STILES, JIM;LEUNG, CHI, KIT;HUNT, TERRY;ACCHIONE, JOE 发明人 XIN, YONGBAO;STILES, JIM;LEUNG, CHI, KIT;HUNT, TERRY;ACCHIONE, JOE
分类号 C09K11/77;C09K11/84;C23C14/00;C23C14/06;C23C14/54;C23C16/06;H05B33/10;H05B33/14;(IPC1-7):C09K11/08;C23C14/30 主分类号 C09K11/77
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