发明名称 DICING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE TO PERFORM PRECISE DICING PROCESS FOR PARTIALLY DICING WAFER TO WHICH SUBSTRATE IS BONDED
摘要 PURPOSE: A dicing apparatus is provided to perform a precise dicing process for partially dicing a wafer to which a substrate is bonded by properly correcting the position of a rotation blade. CONSTITUTION: A wafer is mounted on a wafer stage(10). A blade(11) is disposed on the wafer stage. A light source irradiates detection light to the inside of a cutting groove which is formed in a dicing line region of the wafer by the blade. A recognition camera(15) detects the shape of the cutting groove based upon the reflection light from the cutting groove. A position correcting unit corrects the position of the blade based upon the detection result of the recognition camera so that the center line of the cutting groove is located in a predetermined position and the depth of the cutting groove becomes a predetermined value.
申请公布号 KR20040071646(A) 申请公布日期 2004.08.12
申请号 KR20040007604 申请日期 2004.02.05
申请人 ADVANCED DICING TECHNOLOGIES LTD.;KANTO SANYO SEMICONDUCTORS CO., LTD.;SANYO ELECTRIC CO., LTD. 发明人 WAKUI MOTOAKI;OCHIAI ISAO;EYAL RON;SHETRIT GIL
分类号 H01L21/301;H01L21/44;H01L21/46;H01L21/66;H01L21/78;(IPC1-7):H01L21/78 主分类号 H01L21/301
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