发明名称 |
DICING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE TO PERFORM PRECISE DICING PROCESS FOR PARTIALLY DICING WAFER TO WHICH SUBSTRATE IS BONDED |
摘要 |
PURPOSE: A dicing apparatus is provided to perform a precise dicing process for partially dicing a wafer to which a substrate is bonded by properly correcting the position of a rotation blade. CONSTITUTION: A wafer is mounted on a wafer stage(10). A blade(11) is disposed on the wafer stage. A light source irradiates detection light to the inside of a cutting groove which is formed in a dicing line region of the wafer by the blade. A recognition camera(15) detects the shape of the cutting groove based upon the reflection light from the cutting groove. A position correcting unit corrects the position of the blade based upon the detection result of the recognition camera so that the center line of the cutting groove is located in a predetermined position and the depth of the cutting groove becomes a predetermined value.
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申请公布号 |
KR20040071646(A) |
申请公布日期 |
2004.08.12 |
申请号 |
KR20040007604 |
申请日期 |
2004.02.05 |
申请人 |
ADVANCED DICING TECHNOLOGIES LTD.;KANTO SANYO SEMICONDUCTORS CO., LTD.;SANYO ELECTRIC CO., LTD. |
发明人 |
WAKUI MOTOAKI;OCHIAI ISAO;EYAL RON;SHETRIT GIL |
分类号 |
H01L21/301;H01L21/44;H01L21/46;H01L21/66;H01L21/78;(IPC1-7):H01L21/78 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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