发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR MODULE
摘要 <P>PROBLEM TO BE SOLVED: To efficiently form a through electrode without degrading the quality of the same. <P>SOLUTION: A semiconductor substrate 1 is spin-etched from a rear side 1", so that the semiconductor substrate 1 is made thinner. An opening part 3 is penetrated to form a through hole 3' on the semiconductor substrate 1. The tip of an embedded electrode 7 is made exposed from the through hole 3 of the semiconductor substrate 1, forming a through-electrode 7'. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004228392(A) 申请公布日期 2004.08.12
申请号 JP20030015517 申请日期 2003.01.24
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI KOJI
分类号 H01L23/52;H01L21/304;H01L21/3205;H01L21/44;H01L21/46;H01L21/768;H01L23/48;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L23/52
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