WAFER CLEANING APPARATUS

摘要

PURPOSE: A wafer cleaning apparatus is provided to improve a wafer cleaning effect and prevent an interval of a fabricating time from being delayed by preventing a cleaning solution separated from a wafer from returning to the wafer. CONSTITUTION: A chamber(220) is surrounded by wall surfaces(225), and a cleaning process is performed on the wafer(50) in the chamber. A wafer holder(240) is formed in the chamber. The wafer is placed on the wafer holder. The wafer holder fixes the wafer and performs a horizontal rotation with respect to its center. A cleaning solution supplying unit(260) supplies a cleaning solution to the wafer, formed on the wafer holder. The upper part of the wall surface of the chamber is tilted in the central direction of the chamber at a predetermined angle.