发明名称 SUBSTRATE PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a substrate processor capable of satisfactorily performing a substrate processing without corroding a part where a chemical adheres, even when a prescribed substrate processing is performed by the chemical. SOLUTION: A resin part 10a opposed to a treating space 31, an inner periphery 11a of a rotating axis 11, and a lower side treatment liquid nozzle 15 of a spin base 10, are formed of a fluororesin. Consequently, since parts are not corroded even if the chemical adheres to the resin 10a or a gas supply passage 19 when carrying in substrate processing, a substrate processing can be satisfactorily performed . COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004228433(A) 申请公布日期 2004.08.12
申请号 JP20030016365 申请日期 2003.01.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAWAMURA TAKASHI;KAJINO KAZUKI
分类号 H01L21/683;H01L21/304;H01L21/306;H01L21/68;(IPC1-7):H01L21/304 主分类号 H01L21/683
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