| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus having a preferable inclination angle of a two-dimensional spatial modulation element with respect to the main scanning direction, and to provide a method for adjusting the exposure apparatus. SOLUTION: The exposure apparatus is equipped with a plurality of exposure heads 166<SB>mn</SB>having DMDs (digital micromirror device) 174 inclined with respect to the main scanning direction. Each exposure head 166<SB>mn</SB>has an inclination angle correcting mechanism to correct the inclination angle of the DMD 174 with respect to the main scanning direction. The exposure apparatus 142 is provided with a CCD camera 180 to measure the beam position on the exposure plane and the focal position of the beam, and with an XY stage 182, and a Z stage 184. The exposure apparatus 142 corrects the inclination angle by the inclination angle correcting mechanism on the basis of the measured beam position and focal position. COPYRIGHT: (C)2004,JPO&NCIPI
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