Methods of using polymer films to form micro-structures

摘要

The present invention includes a method of using plasma polymers to form microstructures on substrates. The method includes the steps of forming a polymer film on a substrate having one or more layers of materials thereon in a plasma of a first process gas; removing a first part of polymer film in a plasma of a second process gas; etching the one or more layers of materials in a plasma of a third process gas; and removing a second part of the polymer film in a plasma of a fourth process gas. During the etching of the one or more layers of materials, the second part of the polymer film protects selected portions of the one or more layers of materials from being removed by the plasma of the third process gas.