发明名称 ELECTROOPTICAL SUBSTRATE AND ITS MANUFACTURING METHOD, AND ELECTROOPTICAL DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a constitution that can enhance further the shielding capability in an electrooptical substrate on which a shielding layer has been formed. SOLUTION: The electrooptical substrate 200 is provided with a constitution in which, a semiconductor layer is provided on a base 210, which is provided with a shielding layer 215 having a specific pattern, an insulating layer 212 formed on the shielding layer 215, and a semiconductor layer 206 formed on the insulating layer 212 respectively formed thereon. In the shielding layer 215, a silicon layer 214 is formed on a shielding body layer 211 having a specific pattern. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004228195(A) 申请公布日期 2004.08.12
申请号 JP20030012068 申请日期 2003.01.21
申请人 SEIKO EPSON CORP 发明人 YASUKAWA MASAHIRO
分类号 G02F1/1368;H01L29/786;(IPC1-7):H01L29/786;G02F1/136 主分类号 G02F1/1368
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