TREATMENT EQUIPMENT FOR SEMICONDUCTOR WAFER, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE HAVING PHOTOENGRAVING PROCESS USING THE EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To uniformize the quality of a semiconductor wafer in photoengraving treatment equipment. SOLUTION: The photoengraving treatment equipment contains an air-supply path 1200 for supplying the inside of a chamber treating the wafer 1500 with air, a temperature-humidity controller 1100 installed in front of the air-supply path 1200, a temperature-humidity monitoring sensor 1300 for detecting the temperature and humidity in the chamber and a controller 1000 connected to the monitoring sensor 1300 and the controller 1100 for controlling the controller 1100 so that the inside of the chamber is supplied with air, having the same temperature and humidity as the temperature and humidity of air in the chamber detected by the monitoring sensor 1300 via the air-supply path 1200. COPYRIGHT: (C)2004,JPO&NCIPI