发明名称 Method and apparatus for heating and cooling substrates
摘要 A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.
申请公布号 US2004154185(A1) 申请公布日期 2004.08.12
申请号 US20030701387 申请日期 2003.11.04
申请人 APPLIED MATERIALS, INC. 发明人 MORAD RATSON;SHIN HO SEON;CHEUNG ROBIN;KOGAN IGOR
分类号 H01L21/31;H01L21/00;H01L21/324;H01L21/677;(IPC1-7):B05D3/02;F26B5/04 主分类号 H01L21/31
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