发明名称 VAPOR OXIDATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vapor oxidation apparatus which suppresses condensation of steam in an inert gas accompanied with steam to be fed to a reactor, and obtains the superior controllability and repeatability in steam oxidation of an object to be oxidized to be housed in the reactor. SOLUTION: The steam oxidation apparatus 78 is one to be used when a high Al contained layer is steam oxidized to form a current contracted structure in a surface emitting laser element, and provided with a reactor 42 as a reactor for vapor-oxidating, an inert gas system followed by the vapor for feeding the inert gas accompanied with the steam to the reactor 42, the inert gas system for feeding the inert gas to the reactor 42, a reactor bypass tube 52 for a reactor bypass in the inert gas system accompanied with the steam and the inert gas system, and an exhaust system for exhausting the gas discharged from the reactor 42. The steam oxidation apparatus 78 is provided with a H<SB>2</SB>O bubbler 60, a second gas tube 68, automatic on-off valves 66A to 66D, a third gas tube 70 near the automatic on-off valves 66A to 66D, and a thermostatic bath 72 for accommodating a part of a gas inflow port 42A side of the reactor 42. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004228335(A) 申请公布日期 2004.08.12
申请号 JP20030014260 申请日期 2003.01.23
申请人 SONY CORP 发明人 TANAKA YOSHIYUKI;NARUI HIRONOBU;YAMAUCHI YOSHINORI;WATABE YOSHIAKI;TANAKA SADAO
分类号 H01L21/31;H01L21/00;H01L21/316;(IPC1-7):H01L21/31 主分类号 H01L21/31
代理机构 代理人
主权项
地址