发明名称 NANO STRUCTURE OF DOUBLE CONTINUOUS PHASE OF BLOCK POLYMER PHASE SEPARATION AND ITS APPLICATION
摘要 PROBLEM TO BE SOLVED: To provide a nano structure of double continuous phases of block polymer phase separation which can afford to produce, through the utilization of it, a material that has high transparency, high tensile strength, and high toughness, endures high temperatures, and is easy to process. SOLUTION: The nano structure has reticular double continuous and interpenetrating separated phases, and the base bodies of the two phases (1) are each 0.3-5 nm. One of the two separated phases constituting this nano structure is composed of polymer segments arranged in the ordered direction, and the other is constituted in an amorphous form by the other polymer segments in the same block polymer. Its value in application is developed in the areas of photoelectric polymers, thin film polymers, adsorptive polymers, and the like. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004225042(A) 申请公布日期 2004.08.12
申请号 JP20040001211 申请日期 2004.01.06
申请人 NATIONAL CENTRAL UNIV 发明人 CHEN DENG-KE;HUANG SHIN-MIN
分类号 B82B1/00;C08G18/00;C08G18/08;C08G18/12;C08G18/32;C08G18/69;C08G18/73;C08G18/75;C08G18/80;C08G85/00;(IPC1-7):C08G85/00 主分类号 B82B1/00
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