发明名称 SURFACE OR SECTION PROCESSING OBSERVATION METHOD AND ITS DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To solve the problems wherein, when confirming a laminated structure of a device whose miniaturization and integration are advanced, resolution is insufficient in scanning electron microscope observation, and sample preparation for transmission electron microscope observation is required, and high throughput can not be realized, in the transmission electron microscope observation. <P>SOLUTION: This surface or section processing observation device comprises a means 1 for exposing the surface or the section by processing the sample 5 surface, and a scanning probe microscope means 6 for observing the exposed surface or section. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004226079(A) 申请公布日期 2004.08.12
申请号 JP20030010648 申请日期 2003.01.20
申请人 SEIKO INSTRUMENTS INC 发明人 MINAFUJI TAKASHI;YASUTAKE MASATOSHI;FUJII TOSHIAKI;IWASAKI KOJI;WAKIYAMA SHIGERU;TAKAOKA OSAMU
分类号 B23K26/38;G01N1/28;G01N1/32;G01Q30/20;G01Q60/10;G01Q60/26;G01Q60/30;G01Q60/46;G01Q60/50;H01J37/28;H01J37/30;H01J37/305;H01J37/317;H01L21/66;(IPC1-7):G01N1/28;G01N13/12;G01N13/22;G01N13/16 主分类号 B23K26/38
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