发明名称 |
Mask management device in semiconductor wafer production process |
摘要 |
A wafer production management device includes: a process flow definition table storing for each type of wafer a production flow and a masking level applied in a production process; a basic production information table storing a mask set's name for each type of wafer; a mask information definition table storing for each mask set a plurality of masks' names correlated with a masking level; a lot information table storing a production flow and a type of wafer for each production lot; a processing portion selecting from the basic production information table a mask set's name corresponding to a type of wafer stored for each production lot; a processing portion extracting a masking level based on the current step and the process flow definition table; and a processing portion driven by the mask set's name and the masking level to select a mask's name from the mask information definition table.
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申请公布号 |
US2004158344(A1) |
申请公布日期 |
2004.08.12 |
申请号 |
US20030655039 |
申请日期 |
2003.09.05 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
INOBE TAKAMASA;OOTANI MASAKI;SATO YASUHIRO;MARUME YASUHIRO;WATANABE TOSHIYUKI |
分类号 |
H01L21/027;G03F7/20;G05B19/418;H01L21/00;H01L21/02;(IPC1-7):G06F19/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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